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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Demonstrating production quality multiple exposure patterning aware routing for the 10NM node
Sturtevant, John L., Capodieci, Luigi, Liebmann, Lars, Gerousis, Vassilios, Gutwin, Paul, Zhang, Mike, Han, Geng, Cline, BrianVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2045958
File:
PDF, 1.88 MB
english, 2014