SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Stochastic effects in fabrication of 11nm line-and-space patterns using extreme ultraviolet lithography
Wood, Obert R., Panning, Eric M., Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
9048
Year:
2014
Language:
english
DOI:
10.1117/12.2046225
File:
PDF, 217 KB
english, 2014