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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Post-OPC verification using a full-chip pattern-based simulation verification method
Hung, Chi-Yuan, Wang, Ching-Heng, Ma, Cliff, Zhang, Gary, Weed, J. Tracy, Martin, Patrick M.Volume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632351
File:
PDF, 259 KB
english, 2005