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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Three-dimensional photolithography simulator including rigorous nonplanar exposure simulation for off-axis illumination
Kirchauer, Heinrich, Selberherr, Siegfried, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310809
File:
PDF, 3.22 MB
english, 1998