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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Imaging quality analysis using direct Monte Carlo simulation and CAR reaction model in mask fabrication
Ohfuji, Takeshi, Kuwahara, Naoko, Kurihara, Masa-aki, Kitano, Naoki, Fujimoto, Shigekazu, Hayashi, Naoya, Hwang, David H., Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458366
File:
PDF, 520 KB
english, 2002