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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm
Fuhner, Tim, Erdmann, Andreas, Smith, Bruce W.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.599410
File:
PDF, 1.27 MB
english, 2005