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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Mask pattern quality assurance based on lithography simulation with fine pixel SEM image
Kariya, Mitsuyo, Yamanaka, Eiji, Tanaka, Satoshi, Ikeda, Takahiro, Yamaguchi, Shinji, Hashimoto, Kohji, Itoh, Masamitsu, Kobayashi, Hideaki, Kawashima, Tsukasa, Narukawa, Shogo, Weed, J. Tracy, MartinVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632611
File:
PDF, 920 KB
english, 2005