SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Assessing SEM contour based OPC models quality using rigorous simulation
Wallow, Thomas I., Hohle, Christoph K., Weisbuch, Francois, Samy Naranaya, AravindVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2047826
File:
PDF, 1.67 MB
english, 2014