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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - A simulation study on the impact of lithographic process variations on CMOS device performance
Fühner, Tim, Kampen, Christian, Kodrasi, Ina, Burenkov, Alexander, Erdmann, Andreas, Levinson, Harry J., Dusa, Mircea V.Volume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.772768
File:
PDF, 2.64 MB
english, 2008