SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Bringing SEM-contour based OPC to production
Lai, Kafai, Erdmann, Andreas, Weisbuch, François, Koh, Kar Kit, Jantzen, KennethVolume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2048288
File:
PDF, 1.47 MB
english, 2014