Evaluation of a Novel Cu(I) Precursor for Chemical Vapor...

Electrochemical and Solid-State Letters 2005 Vol. 8; Iss. 7

Evaluation of a Novel Cu(I) Precursor for Chemical Vapor Deposition

Ye, D.-X., Carrow, B., Pimanpang, S., Bakhru, H., Ten Eyck, G. A., Wang, G.-C., Lu, T.-M.
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Volume:
8
Year:
2005
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1922868
File:
PDF, 117 KB
english, 2005
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