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[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Ultrathin interfacial SiO2 layer process research for high-k gate last gate stacks
Zhenping Wen,, Tianjin Xiao,, Hongwei Zhang,, Yuming Qui,, Deqin Yu,, Junlong Kang,, Jingxun Fang,Year:
2015
Language:
english
DOI:
10.1109/CSTIC.2015.7153410
File:
PDF, 980 KB
english, 2015