[IEEE International Semiconductor Device Research Symposium, 2003 - Washington, DC, USA (Dec. 10-12, 2003)] International Semiconductor Device Research Symposium, 2003 - Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectrics and metal gate electrode
Shiyang Zhu,, Yu, H.Y., Whang, S.J., Chen, J.H., Chen Shen,, Chunxiang Zhu,, Lee, S.J., Li, M.F., Chan, D.S.H., Yoo, W.J., Anyan Du,, Tung, C.H., Singh, J., Chin, A., Kwong, D.L.Year:
2003
Language:
english
DOI:
10.1109/ISDRS.2003.1272085
File:
PDF, 126 KB
english, 2003