Repetition of In Situ Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Epitaxial Reactor
Mizuno, Kosuke, Shioda, Kohei, Habuka, Hitoshi, Ishida, Yuuki, Ohno, ToshiyukiVolume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0051602jss
File:
PDF, 743 KB
english, 2016