![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition
Yakshin, A. E., van de Kruijs, R. W. E., Nedelcu, I., Zoethout, E., Louis, E., Bijkerk, F., Enkisch, H., Müllender, S., Lercel, Michael J.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711796
File:
PDF, 231 KB
english, 2007