Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Gablech, Imrich, Svatoš, Vojtěch, Caha, Ondřej, Hrabovský, Miloš, Prášek, Jan, Hubálek, Jaromír, Šikola, TomášVolume:
51
Language:
english
Journal:
Journal of Materials Science
DOI:
10.1007/s10853-015-9648-y
Date:
April, 2016
File:
PDF, 1.93 MB
english, 2016