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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Equilibrium water uptake and diffusion behavior in model polynorbornene photoresist polymers
Hoskins, Trevor, Roman, Paul J., Ludovice, Peter J., Henderson, Clifford L., Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.607434
File:
PDF, 122 KB
english, 2005