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Formation of fluorine-containing defects and nanocrystals in SiO2upon implantation with fluorine, silicon, and germanium ions: Numerical simulation and photoluminescence spectroscopy
Gus’kova, O. P., Vorotyntsev, V. M., Abrosimova, N. D., Mikhaylov, A. N., Tetelbaum, D. I., Shobolov, E. L.Volume:
57
Language:
english
Journal:
Physics of the Solid State
DOI:
10.1134/S106378341511013X
Date:
November, 2015
File:
PDF, 457 KB
english, 2015