Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation
Okoroanyanwu, Uzodinma, Byers, Jeffrey, Shimokawa, Tsutomu, Willson, C. GrantVolume:
10
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm970505x
Date:
November, 1998
File:
PDF, 168 KB
english, 1998