SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - EUV lithography at the 22nm technology node
Wood, Obert, Koay, Chiew-Seng, Petrillo, Karen, Mizuno, Hiroyuki, Raghunathan, Sudhar, Arnold, John, Horak, Dave, Burkhardt, Martin, McIntyre, Gregory, Deng, Yunfei, La Fontaine, Bruno, Okoroanyanwu,Volume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.847049
File:
PDF, 685 KB
english, 2010