SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - High-sensitivity molecular organometallic resist for EUV (MORE)
Wallow, Thomas I., Hohle, Christoph K., Passarelli, James, Murphy, Michael, Del Re, Ryan, Sortland, Miriam, Dousharm, Levi, Vockenhuber, Michaela, Ekinci, Yasin, Neisser, Mark, Freedman, Daniel A., BrVolume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2086599
File:
PDF, 12.11 MB
english, 2015