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Process Sensitivity Analysis and Resolution Prediction for the Two Photon Polymerization of Micro/Nano Structures
Uppal, Nitin, Shiakolas, Panos S.Volume:
131
Year:
2009
Language:
english
Journal:
Journal of Manufacturing Science and Engineering
DOI:
10.1115/1.4000097
File:
PDF, 562 KB
english, 2009