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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Accuracy and performance of 3D mask models in optical projection lithography
Agudelo, Viviana, Evanschitzky, Peter, Erdmann, Andreas, Fühner, Tim, Shao, Feng, Limmer, Steffen, Fey, Dietmar, Dusa, Mircea V.Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879053
File:
PDF, 6.22 MB
english, 2011