Mechanism of etching, polymerization and deposition in R.F....

Pure & Applied Chemistry 1985 / 01 Vol. 57; Iss. 9

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

d’Agostino, R., Capezzuto, P., Bruno, G., Cramarossa, F.
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Volume:
57
Language:
english
Journal:
Pure and Applied Chemistry
DOI:
10.1351/pac198557091287
Date:
January, 1985
File:
PDF, 234 KB
english, 1985
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