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Accurate measurement of atomic chlorine radical density in process plasma with spatially resolvable optical emission spectrometer
Oh, Changhoon, Kang, Minwook, Hahn, Jae WonVolume:
16
Language:
english
Journal:
International Journal of Precision Engineering and Manufacturing
DOI:
10.1007/s12541-015-0249-0
Date:
August, 2015
File:
PDF, 271 KB
english, 2015