SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond
Ogino, Kozo, Hoshino, Hiromi, Maruyama, Takashi, Machida, Yasuhide, Sugatani, Shinji, Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916353
File:
PDF, 806 KB
english, 2012