Amazing diffusion depth of ultra-thin hafnium oxide film grown on n-type silicon by lower temperature atomic layer deposition
Lu, Qihai, Huang, Rong, Lan, Xiaoling, Chi, Xiaowei, Lu, Chao, Li, Cheng, Wu, Zhiguo, Li, Jun, Han, Genliang, Yan, PengxunVolume:
169
Language:
english
Journal:
Materials Letters
DOI:
10.1016/j.matlet.2016.01.087
Date:
April, 2016
File:
PDF, 1.65 MB
english, 2016