In Situ XPS Chemical Analysis of MnSiO 3 Copper Diffusion Barrier Layer Formation and Simultaneous Fabrication of Metal Oxide Semiconductor Electrical Test MOS Structures
Byrne, Conor, Brennan, Barry, McCoy, Anthony P., Bogan, Justin, Brady, Anita, Hughes, GregVolume:
8
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.5b08044
Date:
February, 2016
File:
PDF, 5.21 MB
english, 2016