Sub-30 nm Gate Template Fabrication for Nanoimprint...

Journal of Nanoscience and Nanotechnology 2011 / 02 Vol. 11; Iss. 2

Sub-30 nm Gate Template Fabrication for Nanoimprint Lithography Using Spacer Patterning Technology

Park, Kun-Sik, Baik, Kyu-Ha, Kim, Dong-Pyo, Woo, Jong-Chang, No, Kwang-Soo, Lee, Kijun, Do, Lee-Mi
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Volume:
11
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2011.3379
Date:
February, 2011
File:
PDF, 2.70 MB
english, 2011
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