SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - SEM-contour-based OPC model calibration through the process window
Vasek, Jim, Menedeva, Ovadya, Levitzky, Dan, Lindman, Ofer, Nemadi, Youval, Bailey, George E., Sturtevant, John L., Archie, Chas N.Volume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712232
File:
PDF, 779 KB
english, 2007