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Oxidation mechanism of fluorocarbon-incorporated silica for interlayer dielectric materials
Satoshi Sugahara, Tatsuya Fukumura, Masakiyo MatsumuraVolume:
3
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s1369-8001(00)00011-1
File:
PDF, 284 KB
english, 2000