Varying implant dose rate for defect reduction in laser...

Materials Science in Semiconductor Processing 2001 Vol. 4; Iss. 4

Varying implant dose rate for defect reduction in laser thermal processing

Heather Banisaukas, Kevin S Jones, Somit Talwar, Dan F Downey, Scott Falk
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Volume:
4
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s1369-8001(01)00004-x
File:
PDF, 383 KB
english, 2001
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