Selective doping of silicon by rapid thermal and laser...

Materials Science in Semiconductor Processing 1998 Vol. 1; Iss. 3-4

Selective doping of silicon by rapid thermal and laser assisted processes

U Besi-Vetrella, E Salza, L Pirozzi, S Noel, A Slaoui, J.C Muller
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Volume:
1
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s1369-8001(98)00026-2
File:
PDF, 327 KB
english, 1998
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