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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - High-throughput critical dimensions uniformity (CDU) measurement of two-dimensional (2D) structures using scanning electron microscope (SEM) systems
Fullam, Jennifer, Boye, Carol, Standaert, Theodorus, Gaudiello, John, Tomlinson, Derek, Xiao, Hong, Fang, Wei, Zhang, Xu, Wang, Fei, Ma, Long E., Zhao, Yan, Jau, Jack, Raymond, Christopher J.Volume:
7971
Year:
2011
Language:
english
DOI:
10.1117/12.879910
File:
PDF, 2.22 MB
english, 2011