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Influence of NH3 annealing on the chemical states of HfO2/Al2O3 stacks studied by X-ray photoelectron spectroscopy
Liu, Jian-Shuang, Lu, Hong-Liang, Xu, Sai-Sheng, Wang, Peng-Fei, Ding, Shi-Jin, Zhang, David WeiVolume:
124
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2015.11.018
Date:
February, 2016
File:
PDF, 1.71 MB
english, 2016