Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)
Rahim, M.S., Sahdan, Mohd Zainizan, Lias, JaisVolume:
773-774
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.773-774.744
Date:
July, 2015
File:
PDF, 1.07 MB
english, 2015