Uniform Deposition of Titanium Dioxide Films by Chemical...

Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)

Rahim, M.S., Sahdan, Mohd Zainizan, Lias, Jais
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Volume:
773-774
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.773-774.744
Date:
July, 2015
File:
PDF, 1.07 MB
english, 2015
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