[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists
Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, TakumiVolume:
10.1021/bk
Year:
1998
Language:
english
DOI:
10.1021/bk-1998-0706.ch007
File:
PDF, 1.37 MB
english, 1998