SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advanced Etch Technology for Nanopatterning III - A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly
Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Millward, Dan B., Lugani, Gurpreet S., Khurana, Ranjan, Light, Scott L., Niroomand, Ardavan, Hustad, Philip D., Trefonas, Peter, Chang, Shih-wei, LeVolume:
9054
Year:
2014
Language:
english
DOI:
10.1117/12.2045580
File:
PDF, 1.38 MB
english, 2014