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[IEEE 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) - Rome, Italy (2015.7.27-2015.7.30)] 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO) - MOS memory with double-layer high-κ tunnel oxide Al2O3/HfO2 and ZnO charge trapping layer
El-Atab, Nazek, Nayfeh, Ammar, Turgut, Berk Berkan, Okyay, Ali K.Year:
2015
Language:
english
DOI:
10.1109/NANO.2015.7388722
File:
PDF, 126 KB
english, 2015