SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Physical simulation for verification and OPC on full chip level
Shim, Seongbo, Moon, Seongho, Kim, Youngchang, Choi, Seongwoon, Kim, Younghee, Küchler, Bernd, Klostermann, Ulrich, Do, Munhoe, Lee, Sooryoung, Dusa, Mircea V.Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879577
File:
PDF, 1.41 MB
english, 2011