SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - The lithographic impact of resist model parameters
Smith, Mark D., Byers, Jeffrey D., Mack, Chris A., Sturtevant, John L.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.537581
File:
PDF, 132 KB
english, 2004