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Effects of substrate temperature on the structure, residual stress and nanohardness of Ti6Al4V films prepared by magnetron sputtering
Liu, Gang, Yang, Yanqing, Huang, Bin, Luo, Xian, Ouyang, Sheng, Zhao, Guangming, Jin, Na, Li, PengtaoLanguage:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2016.02.021
Date:
February, 2016
File:
PDF, 4.77 MB
english, 2016