![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Model-driven target optimization to resolve design hotspots through image quality enhancement
Lee, Sung-Woo, Cecil, Tom, Xiao, Guangming, Lee, Mindy, Choi, Jung-Hoe, Baek, Seung-Hee, Jeon, Jin-Hyuck, Park, Chan Ha, Kim, Dave, Lucas, Kevin, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2026140
File:
PDF, 3.98 MB
english, 2013