Shot noise limit of sensitivity of chemically amplified...

Japanese Journal of Applied Physics 2015 / 11 Vol. 54; Iss. 11

Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

Fujii, Shinya, Kozawa, Takahiro, Okamoto, Kazumasa, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.116501
Date:
November, 2015
File:
PDF, 796 KB
english, 2015
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