SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Data Analysis and Modeling for Process Control II - Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, Hans, Carpaij, Rene, Krist, Jouke, Noordman, Oscar, van Dommelen, Youri, van Schoot, Jan, Blok, Frans, van Os, Christian, Stegeman, Sander, Hoogenboom, Tom, Hickman, Craig, Byers, Erik,Volume:
5755
Year:
2005
Language:
english
DOI:
10.1117/12.602129
File:
PDF, 456 KB
english, 2005