Effect of Oxygen Flow Rate and Post Annealing on Vanadium...

Key Engineering Materials 2016 / 1 Vol. 675-676

Effect of Oxygen Flow Rate and Post Annealing on Vanadium Oxide Thin Films Prepared by DC Pulse Magnetron Sputtering

Hincheeranun, Wantanee, Aiempanakit, Montri, Aiempanakit, Kamon, Horprathum, Mati, Patthanasetakul, Viyapon, Nuntawong, Noppadon, Chananonnawathorn, Chanunthorn, Limwichean, Saksorn, Eiamchai, Pitak
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
675-676
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.675-676.233
Date:
January, 2016
File:
PDF, 403 KB
english, 2016
Conversion to is in progress
Conversion to is failed