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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Toward a unified advanced CD-SEM specification for sub-0.18-μm technology
Allgair, John A., Archie, Charles N., Banke, Jr., G. W., Bogardus, E. Hal, Griffith, Joseph E., Marchman, Herschel M., Postek, Jr., Michael T., Saraf, Lumdas H., Schlesinger, Jerry E., Singh, Bhanwar,Volume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308724
File:
PDF, 2.07 MB
english, 1998