![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Mask repair technique assessment and development for the 45nm lithographic node
Marchman, H., Taylor, D., Hadisutjipto, S., Mackay, S., Cottle, R., Maltabes, J., Brown, J., Hoga, MorihisaVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681862
File:
PDF, 1.65 MB
english, 2006