SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Evaluation of resist performance with EUV interference lithography for sub-22-nm patterning
Ekinci, Yasin, Vockenhuber, Michaela, Terhalle, Bernd, Hojeij, Mohamad, Wang, Li, Younkin, Todd R., Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916541
File:
PDF, 6.85 MB
english, 2012