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Structural changes in poly(methyl methacrylate) during deep-etch X-ray synchrotron radiation lithography. Part III: Mode of action of the developer
Olaf Schmalz, Michael Hess, Robert KosfeldVolume:
239
Year:
1996
Language:
english
Pages:
14
DOI:
10.1002/apmc.1996.052390109
File:
PDF, 667 KB
english, 1996